New Smoothing Masks for the Occlusion: Occluding Patterns

D.-H. Kim, N.-W. Kim, and J.-S. Choi (Korea)


computer vision, disparity map, occlusion, left/right check (LRC)


This paper proposes new smoothing masks, i.e., occluding patterns that smooth the disparities of the occlusion. Because an image is composed of several layers and each layer presents similar disparity, the distribution of the estimated disparities has a specific direction around the boundary of the occlusion. This distribution presents the different direction with respect to the left- and the right based disparity map. Therefore the occluding patterns are differently applied according to the direction. We make experiment on the occluding patterns with various stereo images, and we can determine the disparities of the occlusion more accurately than the conventional ones.

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